Spatial stochastic processes for yield and reliability management with applications to nano electronics

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  • Apley, Daniel W.
    • dc.contributor.advisor Kuo, Way en_US
    dc.creator Hwang, Jung Yoon, 1970- en_US
    dc.date.accessioned 2005-02-17T21:03:15Z
    dc.date.available 2005-02-17T21:03:15Z
    dc.date.created 2004-12 en_US
    dc.date.issued 2005-02-17T21:03:15Z
    dc.identifier.uri http://handle.tamu.edu/1969.1/1500
    dc.description.abstract This study uses the spatial features of defects on the wafers to examine the detection and control of process variation in semiconductor fabrication. It applies spatial stochastic process to semiconductor yield modeling and the extrinsic reliabil- ity estimation model. New yield models of integrated circuits based on the spatial point process are established. The defect density which varies according to location on the wafer is modeled by the spatial nonhomogeneous Poisson process. And, in order to capture the variations in defect patterns between wafers, a random coeff- cient model and model-based clustering are applied. Model-based clustering is also applied to the fabrication process control for detecting these defect clusters that are generated by assignable causes. An extrinsic reliability model using defect data and a statistical defect growth model are developed based on the new yield model. en_US
    dc.description.provenance Made available in DSpace on 2005-02-17T21:03:15Z (GMT). No. of bitstreams: 1 etd-tamu-2004C-INEN-Hwang.pdf: 946204 bytes, checksum: 1023bbc80a1ce46fb9c59949d6162646 (MD5) en
    dc.format.extent 946204 bytes
    dc.format.medium electronic en_US
    dc.format.mimetype application/pdf
    dc.language.iso en_US en_US
    dc.publisher Texas A&M University en_US
    dc.subject yield modeling en_US
    dc.subject reliability en_US
    dc.subject integrated circuit en_US
    dc.subject spatial stochastic processes en_US
    dc.subject model-based clustering en_US
    dc.title Spatial stochastic processes for yield and reliability management with applications to nano electronics en_US
    thesis.degree.department Industrial Engineering en_US
    thesis.degree.discipline Industrial Engineering en_US
    thesis.degree.grantor Texas A&M University en_US
    thesis.degree.name Ph. D. en_US
    thesis.degree.level Doctoral en_US
    dc.contributor.committeeMember Garcia-Diaz, Alberto en_US
    dc.contributor.committeeMember en_US
    dc.contributor.committeeMember Wehrly, Thomas E. en_US
    dc.type.genre Electronic Dissertation en_US
    dc.type.material text en_US
    dc.format.digitalOrigin born digital en_US

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